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. 0
that the average: ! fT cos2 (OJt - kr) dt = i where T is the period.
To .
Page 3 of6
TURNOVER
ELEC 214P
3. (a)A beam of light travelling in air is incident normally on a side of an isosceles prism of
refractive index n = 1.35. It is then reflected on a face coated with a perfect conductor and
finally emerges from the front at point (c), and from the other side, at point (b) at an angle ()
as shown in Fig. 3.1. The polarisation of the beam is
perpendi~ular to the plane of~cidence(the plane ofthe figure).E a
Calculate the angle () shown in the figure. [2 marks]
Ifthe amplitude ofthe electric field ofthe incident beam is Eo,
c
calculate the amplitude of both emerging beams ignoring
multiple reflections inside the prism.
[6 marks]
How will this change if the perfect conductor coating is Fig. 3.1
completely removed?
. [3 marks]'
Note: Since we are only interested in the amplitude, ignore the phase change in reflection
and transmission at the interfaces.
The expressions for the reflection and transmission coefficients for a wave with parallel
polarisation with incidence an'g1e (); from a medium with permittivity 6 1 into another of
permittivity 62 are:
cos (}i - ~p2 - sin2 ();
r .1 =.------:.-~====
cos(); +~p2 - sin2 (}i
For normal incidence, the transmission coefficient between a medium 1 and a medium 2
2F; . (going from 1 to 2) is: 112 = F; .J0. if the permeability f..l ofboth media are the same.
q+ ~ .
(b) Electromagnetic compatibility specifications require that some electronic circuits should be
shielded from ambient electromagnetic radiation with an attenuation of at least 150 dB at 1
MHz. A box made' from aluminium sheet needs to be designed for this purpose and the
available sheets are: 0.2, 0.3, 0.4, 0.5 and 0.7 mm thick. Choose the minimum thickness
necessary to satisfy the specification.
[14 marks]
Note: Neglect multiple reflections. .
The conductivity of aluminium is (j = 3.78xl07 Q-lm-l and the skin depth at 1 MHz is
0= 81.9 /-lm.
Remember also that the intrinsic impedance of a conductor is: Z = ;'0 (1 + j)
Page 4 of6
CONTINUED
ELEC 214P
SECTIONB
ANSWER TWO QUESTIONS FROM THIS SECTION
4. (a) Sketch, and fully label, Energy Band Diagrams for the following:
(i) p-type silicon [3 marks]
(ii) the metal gold (Au) and [3 marks]
(iii) p-type silicon when in contact with gold (Au) [4 marks]
(iv) With reference to the diagram in (iii) describe why this structure behaves as a diode
when electrically biased.
[4 marks]
(v) This type ofdiode is considered to be unipolar in nature relying on thermionic emission
to operate. Explain what is meant by the terms in italics and how this device differs from
a p-n junction diode. . .
[4 marks]
(b) Calculate the theoretical barrier height, built-in potential barrier and maximum electric field
in a metal-semiconductor junction diode at zero bias. Take the semiconductor to be Si with
3an electron affinity of4.01eV and a doping level ofND = 1 X 1016 cm- , and the metal to be W
with a work function of4.55eV.
[7 marks]
PageS of6
TURNOVER
'I
ELEC 214P 'l
5. (a) In a bipolar junction transistor (BJT), the common base current gain, a, can be expressed as: '
a= raTO
Give a name and definition of each of the tenns r, aT and 0. Go on to give a mathematical
expression for each in tenns of the currents expected within a BJT in the forward-active mode
of operation, defining the meaning ofthe tenns within your expressions.
[11 marks]
(b) In a BJT the common-emitter gain, fJ, is defmed as:
fJ=Ie / In
where Ie is the collector current and In the base current. Give a mathematical expression for ,
the relationship between' fJ and a. Assuming the values of r, aT and 0 to be equivalent, what
value must they take to give a common-emitter gain value of 100?
[4 marks]
(c) Describe the nature of the Early effect that is found when operating BJTs. Include a suitable
sketch to illustrate your answer. Add a second sketch, which enables you to define the Early
Voltage. What problem does the Early effect cause, and what technological approach can be
implemented to reduce its effect? What problem is created by the solution you have
suggested?
[10 marks]
6. (a) For a silicon MOS structure describe what is meant by the tenns accumulation, depletion and
inversion. Give a mathematical expression for the capacitance of the MOS structure under
each of these conditions.
[6 marks]
Sketch, and fully label, anideal C-V curve for a silicon MOS structure. Describe the effect of
the measurement frequency on this curve.
[7 marks]
Describe the effect of fixed oxide charges and interface charge effects on the C-V curve,
including modified sketches.
[6 marks]
(b) Consider an n-channe1 MOSFET with W = 15J,I.m, L= 2Jlm and Cox = 6.9 x 10-8 F/cm2.
Operation in the non-saturation region gives a drain current for VDS = 0.10 volts which is
1D = 35J1A at VGS = 1.5V is 1= 75J1A, at VGS value = 2.5V. Determine.(i) the inversion carrier
mobility and (ii) the threshold voltage VT.
[6 marks]
Page 6 of6
END OF PAPER